Research work · 2001

Chemical Nanolithography with Electron Beams

Armin Gölzhäuser, Wolfgang Eck, W. Geyer, Volker Stadler, Thomas Weimann, P. Hinze, M. Grunze

Advanced Materials

Abstract

A highly focused electron beam as the agent for spatially selective reductionof nitro groups to amino groups in a self-assembled monolayer of aromatics is the key feature of a novel technique in chemical nanolithography presented here. Treatment of the reactive amino groups with different reactants after each e-beam writing step yields a surface with a defined array of chemically diverse structures; for example, see the line pattern in the Figure.

DOI: 10.1002/1521-4095(200106)13:11%3c803::aid-adma806%3e3.0.co;2-w